검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Effects of morphology and oxygen supply on schizophyllan formation by Schizophyllum commune using a pellet size controlling bioreactor Shu CH, Chou PF, Hsu IC Journal of Chemical Technology and Biotechnology, 80(12), 1383, 2005 |
| 2 |
Use of SIMS in SiGe process control Maul JL, Chou PF, Lu YH Applied Surface Science, 231-2, 713, 2004 |
| 3 |
Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers Dowsett MG, Morris R, Chou PF, Corcoran SF, Kheyrandish H, Cooke GA, Maul JL, Patel SB Applied Surface Science, 203, 500, 2003 |
| 4 |
Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK Wu ZC, Shiung ZW, Wu RG, Liu YL, Wu WH, Tsui BY, Chen MC, Chang W, Chou PF, Jang SM, Hu CH, Liang MS Journal of the Electrochemical Society, 148(6), F109, 2001 |
| 5 |
Physical and electrical characteristics of F- and C-doped low dielectric constant chemical vapor deposited oxides Wu ZC, Shiung ZW, Chiang CC, Wu WH, Chen MC, Jeng SM, Chang W, Chou PF, Jang SM, Yu CH, Liang MS Journal of the Electrochemical Society, 148(6), F115, 2001 |
| 6 |
Physical and electrical characteristics of methylsilane- and trimethylsilane-doped low dielectric constant chemical vapor deposited oxides Wu ZC, Shiung ZW, Chiang CC, Wu WH, Chen MC, Jeng SM, Chang W, Chou PF, Jang SM, Yu CH, Liang MS Journal of the Electrochemical Society, 148(6), F127, 2001 |
| 7 |
Effects of Cobalt Silicidation on the Electrical Characteristics of Shallow P(+)N Junctions Formed by Bf2+ Implantation into Thin Polycrystalline Si Films Lin CT, Chao CH, Juang MH, Jan ST, Chou PF, Cheng HC Journal of the Electrochemical Society, 142(3), 913, 1995 |
| 8 |
Low-Temperature Formation of Shallow P(+)N Junctions by Bf2+ Implantation into Thin Pd2Si Films on Si Substrates Lin CT, Ma KP, Chou PF, Cheng HC Journal of the Electrochemical Society, 142(5), 1579, 1995 |
| 9 |
Effect of Oxygen Impurity on Microstructure and Boron Penetration in a Bf2+ Implanted LPCVD Stacked Amorphous-Silicon P(+) Gated pMOS Capacitor Lin CY, Pan FM, Chou PF, Chang CY Journal of the Electrochemical Society, 142(7), 2434, 1995 |