화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 On the LPCVD-Formed SiO2 Etching Mechanism in CF4/Ar/O-2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure
Son J, Efremov A, Chun I, Yeom GY, Kwon KH
Plasma Chemistry and Plasma Processing, 34(2), 239, 2014
2 Dry etching characteristics of Mo and Al2O3 films in O-2/Cl-2/Ar inductively coupled plasmas
Kwon KH, Efremov A, Yun SJ, Chun I, Kim K
Thin Solid Films, 552, 105, 2014
3 Beaded nanofibers formed during electrospinning
Fong H, Chun I, Reneker DH
Polymer, 40(16), 4585, 1999
4 Effect of the Cr-Rich Oxide Surface on Fast Pumpdown to Ultrahigh-Vacuum
Chun I, Cho B, Chung S
Journal of Vacuum Science & Technology A, 15(5), 2518, 1997
5 Outgassing Rate Characteristic of a Stainless-Steel Extreme High-Vacuum System
Chun I, Cho BL, Chung SM
Journal of Vacuum Science & Technology A, 14(4), 2636, 1996
6 Studies of Optical Haze and Surface-Morphology of Blown Polyethylene Films Using Atomic-Force Microscopy
Smith PF, Chun I, Liu G, Dimitrievich D, Rasburn J, Vancso GJ
Polymer Engineering and Science, 36(16), 2129, 1996