화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Influence of processing and annealing steps on electrical properties of InAlN/GaN high electron mobility transistor with Al2O3 gate insulation and passivation
Cico K, Gregusova D, Kuzmik J, Jurkovic M, Alexewicz A, Poisson MAD, Pogany D, Strasser G, Delage S, Frohlich K
Solid-State Electronics, 67(1), 74, 2012
2 InAIN/GaN metal-oxide-semiconductor high electron mobility transistor with Al2O3 insulating films grown by metal organic chemical vapor deposition using Ar and NH3 carrier gases
Cico K, Kuzmik J, Liday J, Husekova K, Pozzovivo G, Carlin JF, Grandjean N, Pogany D, Vogrincic P, Frohlich K
Journal of Vacuum Science & Technology B, 27(1), 218, 2009
3 Properties of Ru/HfxSi1-xOy/Si metal oxide semiconductor gate stack structures grown by atomic vapor deposition
Frohlich K, Luptak R, Husekova K, Cico K, Tapajna M, Weber U, Baumann PK, Lindner J, Espinos JP
Journal of the Electrochemical Society, 153(8), F176, 2006