검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Small-signal performance and modeling of sub-50 nm nMOSFETs with f(T) above 460-GHz Dimitrov V, Heng JB, Timp K, Dimauro O, Chan R, Hafez M, Feng J, Sorsch T, Mansfield W, Miner J, Kornblit A, Klemens F, Bower J, Cirelli R, Ferry EJ, Taylor A, Feng M, Timp G Solid-State Electronics, 52(6), 899, 2008 |
| 2 |
Wavelength-independent optical lithography Pau S, Nalamasu O, Cirelli R, Frackoviak J, Timko A, Watson P, Klemens F, Timp G Journal of Vacuum Science & Technology B, 18(1), 317, 2000 |
| 3 |
Modeling influence of structural changes in photoacid generators an 193 nm single layer resist imaging Croffie E, Yuan L, Cheng MS, Neureuther A, Houlihan F, Cirelli R, Watson P, Nalamasu O, Gabor A Journal of Vacuum Science & Technology B, 18(6), 3340, 2000 |
| 4 |
Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists Pau S, Trimble LE, Blatchford JW, Watson GP, Frackoviak J, Cirelli R, Nalamasu O Journal of Vacuum Science & Technology B, 17(6), 2499, 1999 |
| 5 |
Quantitation of latent resist images using photon tunneling microscopy Liddle JA, Johnson JA, Cirelli R, Mkrtchyan MM, Novembre AE, Peabody ML Journal of Vacuum Science & Technology B, 16(6), 3651, 1998 |
| 6 |
Photon tunneling microscopy of latent resist images Liddle JA, Fernandez AT, Cirelli R, Mkrtchyan MM, Novembre AE, Peabody ML, Watson GP Journal of Vacuum Science & Technology B, 15(6), 2162, 1997 |
| 7 |
Resist design concepts for 193 nm lithography : Opportunities for innovation and invention Reichmanis E, Nalamasu O, Houlihan FM, Wallow TI, Timko AG, Cirelli R, Dabbagh G, Hutton RS, Novembre AE, Smith BW Journal of Vacuum Science & Technology B, 15(6), 2528, 1997 |
| 8 |
Alignment Scheme for Through-the-Lens Alignment Zipfel G, Stanton S, White D, Vaidya S, Cirelli R Journal of Vacuum Science & Technology B, 13(6), 2665, 1995 |
| 9 |
Effects of Resist Thickness and Thin-Film Interference in I-Line and Deep-Ultraviolet Optical Lithography Xiao JB, Garofalo J, Cirelli R, Vaidya S Journal of Vacuum Science & Technology B, 13(6), 2897, 1995 |
| 10 |
Plasma-Polymerized All-Dry Resist Process for 0.25 Mu-M Photolithography Joubert O, Weidman T, Joshi A, Cirelli R, Stein S, Lee JT, Vaidya S Journal of Vacuum Science & Technology B, 12(6), 3909, 1994 |