검색결과 : 14건
| No. | Article |
|---|---|
| 1 |
Dispersion of multiwalled carbon nanotubes in water by lignin Rochez O, Zorzini G, Amadou J, Claes M, Richel A Journal of Materials Science, 48(14), 4962, 2013 |
| 2 |
Characterization of Modification of 193-nm Photoresist by HBr Plasma Vereecke G, Claes M, Le QT, Kesters E, Struyf H, Carleer R, Adriaensens P Electrochemical and Solid State Letters, 14(10), H408, 2011 |
| 3 |
SELECTIVE REMOVAL OF HIGH-K GATE DIELECTRICS Shamiryan D, Baklanov M, Claes M, Boullart W, Paraschiv V Chemical Engineering Communications, 196(12), 1475, 2009 |
| 4 |
CH-pi interactions as the driving force for silicone-based nanocomposites with exceptional properties Beigbeder A, Linares M, Devalckenaere M, Degee P, Claes M, Beljonne D, Lazzaroni R, Dubois P Advanced Materials, 20(5), 1003, 2008 |
| 5 |
Characterization of post-etched photoresist and residues by various analytical techniques Franquet A, Claes M, Conard T, Kesters E, Vereecke G, Vandervorst W Applied Surface Science, 255(4), 1408, 2008 |
| 6 |
A novel strategy to incorporate carbon nanotubes into thermoplastic matrices Potschke P, Pegel S, Claes M, Bonduel D Macromolecular Rapid Communications, 29(3), 244, 2008 |
| 7 |
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch Kesters E, Claes M, Le QT, Lux M, Franquet A, Vereecke G, Mertens PW, Frank MM, Carleer R, Adriaensens P, Biebuyk JJ, Bebelman S Thin Solid Films, 516(11), 3454, 2008 |
| 8 |
Wet etch characteristics of hafnium silicate layers Claes M, Paraschiv V, Dictus D, Conard T, Delabie A, Van Elshocht S, Zhao C, Everaert JL, Boullart W, Vanhaelemeersch S, De Gendt S Journal of the Electrochemical Society, 153(4), F60, 2006 |
| 9 |
Sequential electrografting and ring-opening metathesis polymerization: a strategy for the tailoring of conductive surfaces Voccia S, Claes M, Jerome R, Jerome C Macromolecular Rapid Communications, 26(10), 779, 2005 |
| 10 |
Bulk properties of MOCVD-deposited HfO2 layers fair high k dielectric applications Van Elshocht S, Baklanov M, Brijs B, Carter R, Caymax M, Carbonell L, Claes M, Conard T, Cosnier V, Date L, De Gendt S, Kluth J, Pique D, Richard O, Vanhaeren D, Vereecke G, Witters T, Zhao C, Heyns M Journal of the Electrochemical Society, 151(10), F228, 2004 |