검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy Chou SI, Baer DS, Hanson RK, Collison WZ, Ni TQ Journal of Vacuum Science & Technology A, 19(2), 477, 2001 |
| 2 |
Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe Collison WZ, Ni TQ, Barnes MS Journal of Vacuum Science & Technology A, 16(1), 100, 1998 |
| 3 |
Electron-Beam Controlled Radio-Frequency Discharges for Plasma Processing Kushner MJ, Collison WZ, Ruzic DN Journal of Vacuum Science & Technology A, 14(4), 2094, 1996 |