검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Crystallinity of Electrically Scaled Atomic Layer Deposited HfO2 from a Cyclical Deposition and Annealing Scheme Consiglio S, Clark RD, Bersch E, LaRose JD, Wells I, Tapily K, Leusink GJ, Diebold AC Journal of the Electrochemical Society, 159(6), G80, 2012 |
| 2 |
Spectroscopic ellipsometry characterization of high-k gate stacks with V-t shift layers Di M, Bersch E, Clark R, Consiglio S, Leusink G, Diebold AC Thin Solid Films, 519(9), 2889, 2011 |
| 3 |
Extension of Far UV spectroscopic ellipsometry studies of High-kappa dielectric films to 130 nm Kamineni VK, Hilfiker JN, Freeouf JL, Consiglio S, Clark R, Leusink GJ, Diebold AC Thin Solid Films, 519(9), 2894, 2011 |
| 4 |
Plasma-assisted atomic layer deposition of conductive hafnium nitride using tetrakis(ethylmethylamino)hafnium for CMOS gate electrode applications Consiglio S, Zeng WX, Berliner N, Eisenbraun ET Journal of the Electrochemical Society, 155(3), H196, 2008 |
| 5 |
Metallorganic chemical vapor deposition of hafnium silicate thin films using a dual source dimethyl-alkylamido approach Consiglio S, Papadatos F, Naczas S, Skordas S, Eisenbraun ET, Kaloyeros AE Journal of the Electrochemical Society, 153(11), F249, 2006 |