화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Remote plasma-enhanced chemical vapor deposition of SiO2 using Ar/N2O and SiH4
Courtney CH, Smith BC, Lamb HH
Journal of the Electrochemical Society, 145(11), 3957, 1998
2 Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon : Surface modification for controlled nucleation
Smith LL, Read WW, Yang CS, Srinivasan E, Courtney CH, Lamb HH, Parsons GN
Journal of Vacuum Science & Technology A, 16(3), 1316, 1998