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The effects of polyvinylpyrrolidone molecular weight on defect-free filling of through-glass vias (TGVs) Jin SH, Yoon Y, Jo YG, Lee SY, Moon HS, Seok SH, Kim MJ, Kim JJ, Lee MH Journal of Industrial and Engineering Chemistry, 96, 376, 2021 |
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Revealing the inhibition effect of quaternary ammonium cations on Cu electrodeposition Jo YE, Yu DY, Cho SK Journal of Applied Electrochemistry, 50(2), 245, 2020 |
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High strength Cu foil without self-annealing prepared by 2M5S-PEG-SPS Lee A, Kim MJ, Choe SH, Kim JJ Korean Journal of Chemical Engineering, 36(6), 981, 2019 |
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Quantitative analysis of nano-defects in thin film encapsulation layer by Cu electrodeposition Chu K, Bae KD, Song BG, Kim J, Park YY, Xianyu W, Lee CS, Sohn Y Applied Surface Science, 453, 31, 2018 |
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Cu seed layer damage caused by insoluble anode in Cu electrodeposition Ham YS, Cho SK, Kim JJ Korean Journal of Chemical Engineering, 34(5), 1490, 2017 |
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Cyanide removal with a copper/active carbon fiber Cathode via a combined oxidation of a Fenton-like reaction and in situ generated copper oxides at anode Tian SC, Li YB, Zhao X Electrochimica Acta, 180, 746, 2015 |
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Low-resistivity Cu film electrodeposited with 3-N,N-dimethylaminodithiocarbamoyl-1-propanesulfonate for the application to the interconnection of electronic devices Cho SK, Kim MJ, Koo HC, Kwon OJ, Kim JJ Thin Solid Films, 520(6), 2136, 2012 |
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Optimization of microvia-technology using excimer laser for build-up layer application in microelectronics Vervaet A, Siau S, De Baets J, Manirambona B Applied Surface Science, 252(23), 8243, 2006 |
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Influence of additives on Cu electrodeposition mechanisms in acid solution: direct current study supported by non-electrochemical measurements Bonou L, Eyraud M, Denoyel R, Massiani Y Electrochimica Acta, 47(26), 4139, 2002 |
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Comparison of the performance of a reactor equipped with a Ti/Pt and an SS anode for simultaneous cyanide removal and copper recovery Szpyrkowicz L, Kaul SN, Molga E, DeFaveri M Electrochimica Acta, 46(2-3), 381, 2000 |