검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Surface chemical state analysis of electroplated Cu film under, Cu-CMP process by means of TOF-SIMS Miyoshi H, Saito R, Kudo M Applied Surface Science, 203, 473, 2003 |
| 2 |
Copper dry etching with Cl-2/Ar plasma chemistry Lee JW, Park YD, Childress JR, Pearton SJ, Sharifi F, Ren F Journal of the Electrochemical Society, 145(7), 2585, 1998 |