화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source
D'Couto GC, Tkach G, Ashtiani KA, Hartsough L, Kim E, Mulpuri R, Lee DB, Levy K, Fissel M, Choi S, Choi SM, Lee HD, Kang HK
Journal of Vacuum Science & Technology B, 19(1), 244, 2001
2 Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization
Klawuhn E, D'Couto GC, Ashtiani KA, Rymer P, Biberger MA, Levy KB
Journal of Vacuum Science & Technology A, 18(4), 1546, 2000