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| No. | Article |
|---|---|
| 1 |
Metal-gate-induced reduction of the interfacial layer in Hf oxide gate stacks Goncharova LV, Dalponte M, Gustafsson T, Celik O, Garfunkel E, Lysaght PS, Bersuker G Journal of Vacuum Science & Technology A, 25(2), 261, 2007 |