화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Intrinsic and Passivation-Induced Trench Tapering During Plasma-Etching
Hamaguchi S, Dalvie M
Journal of the Electrochemical Society, 141(7), 1964, 1994
2 Simulation of Surface-Topography Evolution During Plasma-Etching by the Method of Characteristics
Arnold JC, Sawin HH, Dalvie M, Hamaguchi S
Journal of Vacuum Science & Technology A, 12(3), 620, 1994
3 Microprofile Simulations for Plasma-Etching with Surface Passivation
Hamaguchi S, Dalvie M
Journal of Vacuum Science & Technology A, 12(5), 2745, 1994