검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology Cacciato A, Breuil L, Dekker H, Zahid M, Kar GS, Everaert JL, Schoofs G, Shi X, Van den Bosch G, Jurczak M, Debusschere I, Van Houdt J, Cockburn A, Date L, Xa LQ, Le M, Lee W Electrochemical and Solid State Letters, 14(7), H271, 2011 |
| 2 |
Development of ALD HfZrOx with TDEAH/TDEAZ and H2O Shi X, Tielens H, Takeoka S, Nakabayashi T, Nyns L, Adelmann C, Delabie A, Schram T, Ragnarsson L, Schaekers M, Date L, Schreutelkamp R, Van Elshocht S Journal of the Electrochemical Society, 158(1), H69, 2011 |
| 3 |
Composition and growth kinetics of the interfacial layer for MOCVD HfO2 layers on Si substrates Van Elshocht S, Caymax M, De Gendt S, Conard T, Petry J, Date L, Pique D, Heyns MM Journal of the Electrochemical Society, 151(4), F77, 2004 |
| 4 |
Bulk properties of MOCVD-deposited HfO2 layers fair high k dielectric applications Van Elshocht S, Baklanov M, Brijs B, Carter R, Caymax M, Carbonell L, Claes M, Conard T, Cosnier V, Date L, De Gendt S, Kluth J, Pique D, Richard O, Vanhaeren D, Vereecke G, Witters T, Zhao C, Heyns M Journal of the Electrochemical Society, 151(10), F228, 2004 |