화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Polythiophene-based charge dissipation layer for electron beam lithography of zinc oxide and gallium nitride
Dylewicz R, Lis S, De La Rue RM, Rahman F
Journal of Vacuum Science & Technology B, 28(4), 817, 2010
2 Fabrication of submicron-sized features in InP/InGaAsP/AlGaInAs quantum well heterostructures by optimized inductively coupled plasma etching with Cl-2/Ar/N-2 chemistry
Dylewicz R, De La Rue RM, Wasielewski R, Mazur P, Mezosi G, Bryce AC
Journal of Vacuum Science & Technology B, 28(4), 882, 2010
3 Preparation of large area three-dimensionally ordered macroporous thin films by confined infiltration and crystallisation
McLachlana MA, Barron CCA, Johnson NP, De La Rue RM, McComb DW
Journal of Crystal Growth, 310(10), 2644, 2008
4 Optical characterization of a hydrogen silsesquioxane lithography process
Samarelli A, Macintyre DS, Strain MJ, De La Rue RM, Sorel M, Thoms S
Journal of Vacuum Science & Technology B, 26(6), 2290, 2008
5 Enhanced stitching for the fabrication of photonic structures by electron beam lithography
Gnan M, Macintyre DS, Sorel M, De la Rue RM, Thoms S
Journal of Vacuum Science & Technology B, 25(6), 2034, 2007
6 Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching
Smith CJM, Murad SK, Krauss TF, De la Rue RM, Wilkinson CDW
Journal of Vacuum Science & Technology B, 17(1), 113, 1999
7 Quantum well intermixing in material systems for 1.5 mu m (invited)
Marsh JH, Kowalski OP, McDougall SD, Qiu BC, McKee A, Hamilton CJ, De la Rue RM, Bryce AC
Journal of Vacuum Science & Technology A, 16(2), 810, 1998
8 Reduced damage reactive ion etching process for fabrication of InGaAsP/InGaAs multiple quantum well ridge waveguide lasers
Qiu BC, Ooi BS, Bryce AC, Hicks SE, Wilkinson CDW, De la Rue RM, Marsh JH
Journal of Vacuum Science & Technology B, 16(4), 1818, 1998