검색결과 : 8건
No. | Article |
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1 |
Polythiophene-based charge dissipation layer for electron beam lithography of zinc oxide and gallium nitride Dylewicz R, Lis S, De La Rue RM, Rahman F Journal of Vacuum Science & Technology B, 28(4), 817, 2010 |
2 |
Fabrication of submicron-sized features in InP/InGaAsP/AlGaInAs quantum well heterostructures by optimized inductively coupled plasma etching with Cl-2/Ar/N-2 chemistry Dylewicz R, De La Rue RM, Wasielewski R, Mazur P, Mezosi G, Bryce AC Journal of Vacuum Science & Technology B, 28(4), 882, 2010 |
3 |
Preparation of large area three-dimensionally ordered macroporous thin films by confined infiltration and crystallisation McLachlana MA, Barron CCA, Johnson NP, De La Rue RM, McComb DW Journal of Crystal Growth, 310(10), 2644, 2008 |
4 |
Optical characterization of a hydrogen silsesquioxane lithography process Samarelli A, Macintyre DS, Strain MJ, De La Rue RM, Sorel M, Thoms S Journal of Vacuum Science & Technology B, 26(6), 2290, 2008 |
5 |
Enhanced stitching for the fabrication of photonic structures by electron beam lithography Gnan M, Macintyre DS, Sorel M, De la Rue RM, Thoms S Journal of Vacuum Science & Technology B, 25(6), 2034, 2007 |
6 |
Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching Smith CJM, Murad SK, Krauss TF, De la Rue RM, Wilkinson CDW Journal of Vacuum Science & Technology B, 17(1), 113, 1999 |
7 |
Quantum well intermixing in material systems for 1.5 mu m (invited) Marsh JH, Kowalski OP, McDougall SD, Qiu BC, McKee A, Hamilton CJ, De la Rue RM, Bryce AC Journal of Vacuum Science & Technology A, 16(2), 810, 1998 |
8 |
Reduced damage reactive ion etching process for fabrication of InGaAsP/InGaAs multiple quantum well ridge waveguide lasers Qiu BC, Ooi BS, Bryce AC, Hicks SE, Wilkinson CDW, De la Rue RM, Marsh JH Journal of Vacuum Science & Technology B, 16(4), 1818, 1998 |