검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Kinetic and thermodynamic description of intermediary phases formation in Ti-Al system during reactive sintering Skolakova A, Leitner J, Salvetr P, Novak P, Deduytsche D, Kopecek J, Detavernier C, Vojtech D Materials Chemistry and Physics, 230, 122, 2019 |
| 2 |
A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after Atomic Layer Deposition of alumina Vandegehuchte BD, Thybaut JW, Detavernier C, Deduytsche D, Dendooven J, Martens JA, Sree SP, Koranyi TI, Marin GB Journal of Catalysis, 311, 433, 2014 |
| 3 |
Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition Rampelberg G, Deduytsche D, De Schutter B, Premkumar PA, Toeller M, Schaekers M, Martens K, Radu I, Detavernier C Thin Solid Films, 550, 59, 2014 |
| 4 |
TaN/Ta as an Effective Diffusion Barrier for Direct Contact of Copper and NiSi Jiang YL, Xie Q, Qu XP, Zhang DW, Deduytsche D, Detavernier C Electrochemical and Solid State Letters, 15(1), H9, 2012 |
| 5 |
Effective Electrical Passivation of Ge(100) for HfO2 Gate Dielectric Layers Using O-2 Plasma Xie Q, Deduytsche D, Schaekers M, Caymax M, Delabie A, Qu XP, Detavernier C Electrochemical and Solid State Letters, 14(5), G20, 2011 |
| 6 |
Effective Schottky Barrier Height Modulation by an Ultrathin Passivation Layer of GeOxNy for Al/n-Ge(100) Contact Jiang YL, Xie Q, Qu XP, Ru GP, Zhang DW, Deduytsche D, Detavernier C Electrochemical and Solid State Letters, 14(12), H487, 2011 |
| 7 |
Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition Dendooven J, Deduytsche D, Musschoot J, Vanmeirhaeghe RL, Detavernier C Journal of the Electrochemical Society, 157(4), G111, 2010 |
| 8 |
Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability Dendooven J, Deduytsche D, Musschoot J, Vanmeirhaeghe RL, Detavernier C Journal of the Electrochemical Society, 156(4), P63, 2009 |
| 9 |
Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide Musschoot J, Deduytsche D, Poelman H, Haemers J, Van Meirhaeghe RL, Van den Berghe S, Detavernier C Journal of the Electrochemical Society, 156(7), P122, 2009 |
| 10 |
Ru thin film grown on TaN by plasma enhanced atomic layer deposition Xie Q, Jiang YL, Musschoot J, Deduytsche D, Detavernier C, Van Meirhaeghe RL, Van den Berghe S, Ru GP, Li BZ, Qu XP Thin Solid Films, 517(16), 4689, 2009 |