검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Highly reliable growth process of carbon nanowalls using radical injection plasma-enhanced chemical vapor deposition Kondo S, Hori M, Yamakawa K, Den S, Kano H, Hiramatsu M Journal of Vacuum Science & Technology B, 26(4), 1294, 2008 |
| 2 |
Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films Kikukawa D, Hori M, Honma K, Yamamoto M, Goto T, Takahashi S, Den S Journal of Vacuum Science & Technology A, 24(6), 2128, 2006 |
| 3 |
Influence on Selective SiO2/Si Etching of Carbon-Atoms Produced by CH4 Addition to a C4F8 Permanent-Magnet Electron-Cyclotron-Resonance Etching Plasma Den S, Kuno T, Ito M, Hori M, Goto T, Okeeffe P, Hayashi Y, Sakamoto Y Journal of Vacuum Science & Technology A, 15(6), 2880, 1997 |
| 4 |
Energy-Selective Electron-Cyclotron-Resonance Plasma for Controlled Surface-Reaction Processes Okeeffe P, Mutoh H, Den S, Hayashi Y, Komuro S, Morikawa T Thin Solid Films, 281-282, 102, 1996 |
| 5 |
A Rectangular Large ECR Plasma Source Tada S, Miyazawa W, Sakamoto Y, Den S, Hayashi Y Thin Solid Films, 281-282, 149, 1996 |