화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Effect of carbon contamination on the printing performance of extreme ultraviolet masks
Fan YJ, Yankulin L, Antohe A, Thomas P, Mbanaso C, Garg R, Wang YF, Wust A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G
Journal of Vacuum Science & Technology B, 28(2), 321, 2010
2 Are extreme ultraviolet resists ready for the 32 nm node?
Petrillo K, Wei Y, Brainard R, Denbeaux G, Goldfarb D, Koay CS, Mackey J, Montgomery W, Pierson W, Wallow T, Wood O
Journal of Vacuum Science & Technology B, 25(6), 2490, 2007
3 Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy
Chao W, Anderson EH, Denbeaux G, Harteneck B, Pearson AL, Olynick D, Salmassi F, Song C, Attwood D
Journal of Vacuum Science & Technology B, 21(6), 3108, 2003
4 Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy
Schneider G, Meyer MA, Denbeaux G, Anderson E, Bates B, Pearson A, Knochel C, Hambach D, Stach EA, Zschech E
Journal of Vacuum Science & Technology B, 20(6), 3089, 2002
5 Nanofabrication and diffractive optics for high-resolution x-ray applications
Anderson EH, Olynick DL, Harteneck B, Veklerov E, Denbeaux G, Chao WL, Lucero A, Johnson L, Attwood D
Journal of Vacuum Science & Technology B, 18(6), 2970, 2000