화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition
Cibert C, Hidalgo H, Champeaux C, Tristant P, Tixier C, Desmaison J, Catherinot A
Thin Solid Films, 516(6), 1290, 2008
2 Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition
Sanchez G, Wu A, Tristant P, Tixier C, Soulestin B, Desmaison J, Alles AB
Thin Solid Films, 516(15), 4868, 2008
3 High-temperature oxidation behaviour of a hot isostatically-pressed Si3N4-HfB2 ceramic composite
Klein R, Desmaison-Brut M, Desmaison J, Mazerolles L, Trichet MF
Materials Science Forum, 461-464, 849, 2004
4 Physico-chemistry and morphology of silicon surface during the first stage of alumina deposition
Jonnard P, Desmaison J, Hidalgo H, Rossignol F, Tixier C, Tristant P
Applied Surface Science, 212, 674, 2003
5 High temperature oxidation kinetics of non-oxide monolithic and particulate composite ceramics
Desmaison J, Desmaison-Brut M
Materials Science Forum, 369-3, 39, 2001
6 Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias
Tristant P, Ding Z, Vinh QBT, Hidalgo H, Jauberteau JL, Desmaison J, Dong C
Thin Solid Films, 390(1-2), 51, 2001
7 Study of the Adhesion Between A-CH Films and Ta6V Substrates by Electron-Induced X-Ray-Emission Spectroscopy (Exes)
Jonnard P, Tixier C, Desmaison J, Hombourger C, Bonnelle C
Thin Solid Films, 306(1), 119, 1997