| 1 |
Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth
Barbe J, Xie L, Leifer K, Faucherand P, Morin C, Rapisarda D, De Vito E, Makasheva K, Despax B, Perraud S
Thin Solid Films, 522, 136, 2012 |
| 2 |
Ageing of plasma-mediated coatings with embedded silver nanoparticles on stainless steel: An XPS and ToF-SIMS investigation
Zanna S, Saulou C, Mercier-Bonin M, Despax B, Raynaud P, Seyeux A, Marcus P
Applied Surface Science, 256(22), 6499, 2010 |
| 3 |
Physico-chemical, structural and physical properties of hydrogenated silicon oxinitride films elaborated by pulsed radiofrequency discharge
Bedjaoui M, Despax B
Thin Solid Films, 518(15), 4142, 2010 |
| 4 |
Optical characterization and microstructure of BaTiO3 thin films obtained by RF-magnetron sputtering
Ianculescu A, Gartner M, Despax B, Bley V, Lebey T, Gavrila R, Modreanu M
Applied Surface Science, 253(1), 344, 2006 |
| 5 |
Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH4-N2O and SiH4-N2O-He radiofrequency discharges
Chayani M, Caquineau H, Despax B, Bandet J, Berjoan R
Thin Solid Films, 471(1-2), 53, 2005 |
| 6 |
Feasibility of an isolation by local oxidation of silicon without field implant
Fay JL, Beluch J, Despax B, Sarrabayrouse G
Solid-State Electronics, 45(8), 1257, 2001 |
| 7 |
Structural characteristics of RF-sputtered BaTiO3 thin films
Preda L, Courselle L, Despax B, Bandet J, Ianculescu A
Thin Solid Films, 389(1-2), 43, 2001 |
| 8 |
Internal r.f. plasma parameters correlated with structure and properties of deposited hydrocarbon films
Hallil A, Despax B
Thin Solid Films, 358(1-2), 30, 2000 |
| 9 |
Influence of the Reactor Design in the Case of Silicon-Nitride PECVD
Caquineau H, Despax B
Chemical Engineering Science, 52(17), 2901, 1997 |
| 10 |
Reactor Modeling for Radio-Frequency Plasma Deposition of Sinxhy - Comparison Between 2 Reactor Designs
Caquineau H, Dupont G, Despax B, Couderc JP
Journal of Vacuum Science & Technology A, 14(4), 2071, 1996 |
