| 1 |
Titania nanotube-silver phosphate hybrid heterostructure for improved visible light induced photocatalysis
Niraula M, Adhikari S, Lee DY, Kim EK, Yoon SJ, Dhungel SK, Lee W, Shrestha NK, Han SH
Chemical Physics Letters, 593, 193, 2014 |
| 2 |
Optimization of paste formulation for TiO2 nanoparticles with wide range of size distribution for its application in dye sensitized solar cells
Dhungel SK, Park JG
Renewable Energy, 35(12), 2776, 2010 |
| 3 |
Optimization of fabrication process of high-efficiency and low-cost crystalline silicon solar cell for industrial applications
Lee J, Lakshminarayan N, Dhungel SK, Kim K, Yi J
Solar Energy Materials and Solar Cells, 93(2), 256, 2009 |
| 4 |
Study of electrical properties of oxidized porous silicon for back surface passivation of silicon solar cells
Dhungel SK, Yoo J, Kim K, Ghosh S, Jung S, Yi J
Renewable Energy, 33(2), 282, 2008 |
| 5 |
Field-induced surface passivation of p-type silicon by using AlON films
Ghosh SN, Parm IO, Dhungel SK, Jang KS, Jeong SW, Yoo J, Hwang SH, Yi J
Renewable Energy, 33(2), 320, 2008 |
| 6 |
Texturing of large area multi-crystalline silicon wafers through different chemical approaches for solar cell fabrication
Kim Y, Dhungel SK, Jung S, Mangalaraj D, Yi J
Solar Energy Materials and Solar Cells, 92(8), 960, 2008 |
| 7 |
Comparative study of different approaches of multicrystalline silicon texturing for solar cell fabrication
Gangopadhyay U, Dhungel SK, Basu PK, Dutta SK, Saha H, Yi J
Solar Energy Materials and Solar Cells, 91(4), 285, 2007 |
| 8 |
Novel low-cost approach for removal of surface contamination before texturization of commercial monocrystalline silicon solar cells
Gangopadhyay U, Dhungel SK, Mondal AK, Saha H, Yi J
Solar Energy Materials and Solar Cells, 91(12), 1147, 2007 |
| 9 |
Properties of plasma enhanced chemical vapor deposited silicon nitride for the application in multicrystalline silicon solar cells
Yoo J, Dhungel SK, Yi J
Thin Solid Films, 515(12), 5000, 2007 |
| 10 |
Electrical properties of ultra-thin oxynitrided layer using N2O plasma in inductively coupled plasma chemical vapor deposition for non-volatile memory on glass
Jung S, Hwang S, Kim K, Dhungel SK, Chung HK, Choi BD, Lee KY, Yi J
Thin Solid Films, 515(16), 6615, 2007 |
