화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Impact of metal etch residues on etch species density and uniformity
Dictus D, Shamiryan D, Paraschiv V, Boullart W, De Gendt S, Vinckier C
Journal of Vacuum Science & Technology B, 28(4), 789, 2010
2 Unusual Modification of CuCl or CuBr Films by He Plasma Exposure Resulting in Nanowire Formation
Dictus D, Baklanov MR, Pikulev V, De Gendt S, Vinckier C, Boullart W, Vanhaelemeersch S
Langmuir, 26(3), 2014, 2010
3 Using ellipsometry for assessment of TiN surface roughness after plasma etch
Shamiryan D, Paraschiv V, Dictus D, Baklanov MR, Beckx S, Boullart W
Journal of the Electrochemical Society, 155(2), H108, 2008
4 Wet etch characteristics of hafnium silicate layers
Claes M, Paraschiv V, Dictus D, Conard T, Delabie A, Van Elshocht S, Zhao C, Everaert JL, Boullart W, Vanhaelemeersch S, De Gendt S
Journal of the Electrochemical Society, 153(4), F60, 2006
5 Influence of crystallographic orientation on dry etch properties of TiN
Dictus D, Shamiryan D, Paraschiv V, Boullart W, De Gendt S, Vanhaelemeersch S
Journal of Vacuum Science & Technology B, 24(5), 2472, 2006