| 1 |
Influence of argon dilution on growth and properties of hydrogenated nanocrystalline silicon films
Parashar A, Kumar S, Gope J, Rauthan CMS, Dixit PN, Hashmi SA
Solar Energy Materials and Solar Cells, 94(5), 892, 2010 |
| 2 |
High-pressure condition of SiH4+Ar+H-2 plasma for deposition of hydrogenated nanocrystalline silicon film
Parashar A, Kumar S, Dixit PN, Gope J, Rauthan CMS, Hashmi SA
Solar Energy Materials and Solar Cells, 92(10), 1199, 2008 |
| 3 |
Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films
Panwar OS, Khan MA, Kumar M, Shivaprasad SM, Satyanarayana BS, Dixit PN, Bhattacharyya R, Khan MY
Thin Solid Films, 516(8), 2331, 2008 |
| 4 |
Amorphous silicon films with high deposition rate prepared using argon and hydrogen diluted silane for stable solar cells
Gogoi P, Dixit PN, Agarwal P
Solar Energy Materials and Solar Cells, 91(13), 1253, 2007 |
| 5 |
Reflectance and photoluminescence spectra of as grown and hydrogen and nitrogen incorporated tetrahedral amorphous carbon films deposited using an S bend filtered cathodic vacuum arc process
Panwar OS, Khan MA, Bhattacharjee B, Pal AK, Satyanarayana BS, Dixit PN, Bhattacharyya R, Khan MY
Thin Solid Films, 515(4), 1597, 2006 |
| 6 |
Effect of substrate bias on SE, XPS and XAES studies of diamond-like carbon films deposited by saddle field fast atom beam source
Sharma R, Panwar OS, Kumar S, Sarangi D, Goullet A, Dixit PN, Bhattacharyya R
Applied Surface Science, 220(1-4), 313, 2003 |
| 7 |
Electron field-emission from diamond-like carbon films grown by a saddle field fast atom beam source
Panwar OS, Sharma R, Kumar S, Dixit PN
Journal of Vacuum Science & Technology B, 21(5), 1986, 2003 |
| 8 |
Photoconducting a-Si : H films grown at high deposition rates by pulsing a VHF 100 MHz discharge
Mukherjee C, Anandan C, Seth T, Dixit PN, Bhattacharyya R
Thin Solid Films, 423(1), 18, 2003 |
| 9 |
Realization of different carbon nanostructures by a microwave plasma enhanced chemical vapor deposition technique
Kumar S, Rauthan CMS, Srivatsa KMK, Dixit PN, Bhattacharyya R
Applied Surface Science, 182(3-4), 326, 2001 |
| 10 |
Composition of glass substrates, an important consideration for depositing adherent diamond-like carbon films
Kumar S, Kumar S, Dixit PN, Rauthan CMS, Sharma R, Khan MY, Bhattacharyya R
Journal of Materials Science Letters, 19(22), 2055, 2000 |
