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| No. | Article |
|---|---|
| 1 |
Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line Le Gouil A, Cabuil N, Dupeyrat P, Dickson B, Kwan M, Barge D, Gurer E, Doclot O, Royer JC Journal of Vacuum Science & Technology A, 26(4), 805, 2008 |