검색결과 : 2건
No. | Article |
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1 |
Characterization of Cl-2/Ar high density plasmas for semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE Journal of Vacuum Science & Technology A, 17(1), 38, 1999 |
2 |
Characterization of high density CH4/H-2/Ar plasmas for compound semiconductor etching Eddy CR, Leonhardt D, Douglass SR, Shamamian VA, Thoms BD, Butler JE Journal of Vacuum Science & Technology A, 17(3), 780, 1999 |