화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Characterization of Cl-2/Ar high density plasmas for semiconductor etching
Eddy CR, Leonhardt D, Douglass SR, Thoms BD, Shamamian VA, Butler JE
Journal of Vacuum Science & Technology A, 17(1), 38, 1999
2 Characterization of high density CH4/H-2/Ar plasmas for compound semiconductor etching
Eddy CR, Leonhardt D, Douglass SR, Shamamian VA, Thoms BD, Butler JE
Journal of Vacuum Science & Technology A, 17(3), 780, 1999