검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Experimentation and modeling of organic photocontamination on lithographic optics Kunz RR, Liberman V, Downs DK Journal of Vacuum Science & Technology B, 18(3), 1306, 2000 |
| 2 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 3 |
Outlook for 157 nm resist design Kunz RR, Bloomstein TM, Hardy DE, Goodman RB, Downs DK, Curtin JE Journal of Vacuum Science & Technology B, 17(6), 3267, 1999 |
| 4 |
Outgassing of organic vapors from 193 nm photoresists: Impact on atmospheric purity near the lens optics Kunz RR, Downs DK Journal of Vacuum Science & Technology B, 17(6), 3330, 1999 |