검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Effect of near-substrate plasma density in the reactive magnetron sputter deposition of hydrogenated amorphous germanium Kaufman-Osborn T, Pollock KM, Hiltrop J, Braam K, Fazzio S, Doyle JR Thin Solid Films, 520(6), 1866, 2012 |
| 2 |
Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H Doyle JR, Xu Y, Reedy R, Branz HM, Mahan AH Thin Solid Films, 516(5), 526, 2008 |
| 3 |
Effects of surface topography on oxide deposition rates using TEOS/O-2 chemistry Doyle JR, Feng GFJ Journal of Vacuum Science & Technology B, 17(5), 2147, 1999 |
| 4 |
Effect of Anode Bias on Plasma-Confinement in Direct-Current Magnetron Discharges Doyle JR, Nuruddin A, Abelson JR Journal of Vacuum Science & Technology A, 12(3), 886, 1994 |