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| No. | Article |
|---|---|
| 1 |
Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source Monaghan E, Michna T, Gaman C, O'Farrel D, Ryan K, Adley D, Perova TS, Drews B, Jaskot M, Ellingboe AR Thin Solid Films, 519(20), 6884, 2011 |