| 1 |
Gas heating and throw distance for the sputter deposition of aluminum and tungsten
Drusedau TP
Journal of Vacuum Science & Technology A, 20(2), 459, 2002 |
| 2 |
Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen
Drusedau TP, Blasing J
Thin Solid Films, 377-378, 27, 2000 |
| 3 |
Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations
Drusedau TP, Bock T, John TM, Klabunde F, Eckstein W
Journal of Vacuum Science & Technology A, 17(5), 2896, 1999 |
| 4 |
Deposition of nanocrystalline silicon mediated by ultrathin aluminum underlayers by PCVD and sputter-deposition at 500 K
Drusedau TP, Diez A, Blasing J
Thin Solid Films, 337(1-2), 41, 1999 |
| 5 |
Decay length of the pressure dependent deposition rate for magnetron sputtering
Drusedau TP, Lohmann M, Garke B
Journal of Vacuum Science & Technology A, 16(4), 2728, 1998 |
| 6 |
Germanium-Carbon Multilayer Films Prepared by Magnetron Sputtering - Structure and Thermally-Induced Formation of Ge-Nanocrystals
John TM, Veit P, Anton R, Drusedau TP
Thin Solid Films, 296(1-2), 69, 1997 |
