1 |
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching Osipov AA, Iankevich GA, Alexandrov SE Plasma Chemistry and Plasma Processing, 40(1), 423, 2020 |
2 |
Plasma etched c-Si wafer with proper pyramid-like nanostructures for photovoltaic applications Addonizio ML, Antonaia A, Fusco L Applied Surface Science, 467, 143, 2019 |
3 |
Origin of the dry etch damage in the short-channel oxide thin-film transistors for high resolution display application Choi JH, Yang JH, Pi JE, Hwang CY, Kim HO, Hwang CS Thin Solid Films, 674, 71, 2019 |
4 |
Surface chemistry of thermal dry etching of cobalt thin films using hexafluoroacetylacetone (hfacH) Zhao J, Konh M, Teplyakov A Applied Surface Science, 455, 438, 2018 |
5 |
Ultra-low rate dry etching conditions for fabricating normally-off field effect transistors on AlGaN/GaN heterostructures Kim ZS, Lee HS, Na J, Bae SB, Nam E, Lim JW Solid-State Electronics, 140, 12, 2018 |
6 |
Effects of 3D microlens transfer into fused silica substrate by CF4/O-2 dry etching Grigaliunas V, Jucius D, Lazauskas A, Andrulevicius M, Sakaliuniene J, Abakeviciene B, Kopustinskas V, Smetona S, Tamulevicius S Applied Surface Science, 393, 287, 2017 |
7 |
Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O-2/Ar gas mixtures Lee JY, Choi JS, Cho DH, Hwang SM, Chung CW Thin Solid Films, 636, 325, 2017 |
8 |
Different methods to alter surface morphology of high aspect ratio structures Leber M, Shandhi MMH, Hogan A, Solzbacher F, Bhandari R, Negi S Applied Surface Science, 365, 180, 2016 |
9 |
Fabrication of hierarchical anti-reflective structures using polystyrene sphere lithography on an as-cut p-Si substrate Chou YY, Lee KT, Lee YC Applied Surface Science, 377, 81, 2016 |
10 |
On the emitter formation in nanotextured silicon solar cells to achieve improved electrical performances Kafle B, Schon J, Fleischmann C, Werner S, Wolf A, Clochard L, Duffy E, Hofmann M, Rentsch J Solar Energy Materials and Solar Cells, 152, 94, 2016 |