화학공학소재연구정보센터
검색결과 : 21건
No. Article
1 Monolayer Doping of Germanium with Arsenic: A New Chemical Route to Achieve Optimal Dopant Activation
Kennedy N, Garvey S, Maccioni B, Eaton L, Nolan M, Duffy R, Meaney F, Kennedy M, Holmes JD, Long B
Langmuir, 36(34), 9993, 2020
2 Working governance for working land
Brockington D, Adams WM, Agarwal B, Agrawal A, Buscher B, Chhatre A, Duffy R, Fletcher R, Oldekop JA
Science, 362(6420), 1257, 2018
3 Biology's drones: Undermined by fear
Humle T, Duffy R, Roberts DL, Sandbrook C, St John FAV, Smith RJ
Science, 344(6190), 1351, 2014
4 Impact ionization induced dynamic floating body effect in junctionless transistors
Yu R, Nazarov AN, Lysenko VS, Das S, Ferain I, Razavi P, Shayesteh M, Kranti A, Duffy R, Colinge JP
Solid-State Electronics, 90, 28, 2013
5 Catalytic Carbene Insertion into C-H Bonds
Doyle MP, Duffy R, Ratnikov M, Zhou L
Chemical Reviews, 110(2), 704, 2010
6 Simulation of p-n junctions: Present and future challenges for technologies beyond 32 nm
Pelaz L, Marques LA, Aboy M, Santos I, Lopez P, Duffy R
Journal of Vacuum Science & Technology B, 28(1), C1A1, 2010
7 Experimental studies of dose retention and activation in fin field-effect-transistor-based structures
Mody J, Duffy R, Eyben P, Goossens J, Moussa A, Polspoel W, Berghmans B, van Dal MJH, Pawlak BJ, Kaiser M, Weemaes RGR, Vandervorst W
Journal of Vacuum Science & Technology B, 28(1), C1H5, 2010
8 Experimental studies of dose retention and activation in fin field-effect-transistor-based structures (vol 28, pg C1H5, 2010)
Mody J, Duffy R, Eyben P, Goossens J, Moussa A, Polspoel W, Berghmans B, van Dal MJH, Pawlak BJ, Kaiser M, Weemaes RGR, Vandervorst W
Journal of Vacuum Science & Technology B, 28(3), 648, 2010
9 Quantitative prediction of junction leakage in bulk-technology CMOS devices
Duffy R, Heringa A, Venezia VC, Loo J, Verheijen MA, Hopstaken MJP, van der Tak K, de Potter M, Hooker JC, Meunier-Beillard P, Delhougne R
Solid-State Electronics, 54(3), 243, 2010
10 Performance improvement in narrow MuGFETs by gate work function and source/drain implant engineering
Ferain I, Duffy R, Collaert N, van Dal MJH, Pawlak BJ, O'Sullivan B, Witters L, Rooyackers R, Conard T, Popovici M, van Elshocht S, Kaiser M, Weemaes RGR, Swerts J, Jurczak M, Lander RJP, De Meyer K
Solid-State Electronics, 53(7), 760, 2009