검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Endpoint detection of Ge2Sb2Te5 during chemical mechanical planarization He AD, Liu B, Song ZT, Liu WL, Lu YG, Wang LY, Wu GP, Feng SL Applied Surface Science, 283, 304, 2013 |
| 2 |
Granulation time in fluidized bed granulators Roy P, Khanna R, Subbarao D Powder Technology, 199(1), 95, 2010 |
| 3 |
In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry Meng XF, Li LF Applied Surface Science, 254(17), 5421, 2008 |
| 4 |
Multi-way principal component analysis for the endpoint detection of the metal etch process using the whole optical emission spectra Han K, Park KJ, Chae H, Yoon ES Korean Journal of Chemical Engineering, 25(1), 13, 2008 |
| 5 |
Interferometric Real-Time Measurement of Uniformity for Plasma-Etching Dalton TJ, Conner WT, Sawin HH Journal of the Electrochemical Society, 141(7), 1893, 1994 |