화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 The effects of reactor design on the synthesis of titanium carbide-derived carbon
Dutzer MR, Mangarella MC, Schott JA, Dai S, Walton KS
Chemical Engineering Science, 160, 191, 2017
2 Modeling and simulation of plasma etching reactors for microelectronics
Economou DJ
Thin Solid Films, 365(2), 348, 2000
3 Comparison of experiments with a lumped parameter model of the plasma assisted chemical vapor deposition of copper
Lakshmanan SK, Gill WN
Journal of the Electrochemical Society, 145(2), 694, 1998
4 Modeling and Control of Microelectronics Materials Processing
Badgwell TA, Breedijk T, Bushman SG, Butler SW, Chatterjee S, Edgar TF, Toprac AJ, Trachtenberg I
Computers & Chemical Engineering, 19(1), 1, 1995
5 In-Situ Diode-Laser Absorption-Measurements of Plasma Species in a Gaseous Electronics Conference Reference Cell Reactor
Oh DB, Stanton AC, Anderson HM, Splichal MP
Journal of Vacuum Science & Technology B, 13(3), 954, 1995
6 Modeling and Simulation of Glow-Discharge Plasma Reactors
Lymberopoulos DP, Economou DJ
Journal of Vacuum Science & Technology A, 12(4), 1229, 1994