검색결과 : 6건
No. | Article |
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1 |
The effects of reactor design on the synthesis of titanium carbide-derived carbon Dutzer MR, Mangarella MC, Schott JA, Dai S, Walton KS Chemical Engineering Science, 160, 191, 2017 |
2 |
Modeling and simulation of plasma etching reactors for microelectronics Economou DJ Thin Solid Films, 365(2), 348, 2000 |
3 |
Comparison of experiments with a lumped parameter model of the plasma assisted chemical vapor deposition of copper Lakshmanan SK, Gill WN Journal of the Electrochemical Society, 145(2), 694, 1998 |
4 |
Modeling and Control of Microelectronics Materials Processing Badgwell TA, Breedijk T, Bushman SG, Butler SW, Chatterjee S, Edgar TF, Toprac AJ, Trachtenberg I Computers & Chemical Engineering, 19(1), 1, 1995 |
5 |
In-Situ Diode-Laser Absorption-Measurements of Plasma Species in a Gaseous Electronics Conference Reference Cell Reactor Oh DB, Stanton AC, Anderson HM, Splichal MP Journal of Vacuum Science & Technology B, 13(3), 954, 1995 |
6 |
Modeling and Simulation of Glow-Discharge Plasma Reactors Lymberopoulos DP, Economou DJ Journal of Vacuum Science & Technology A, 12(4), 1229, 1994 |