화학공학소재연구정보센터
검색결과 : 38건
No. Article
1 Broad-range ultrafast all-optical red-shifting of EUV surface plasmons: Proof-of-principle and advanced surface nanotexturing in aluminum
Kudryashov SI, Saraeva IN, Rudenko AA, Ionin AA
Applied Surface Science, 471, 23, 2019
2 Vacuum ultraviolet quarter wave plates based on SnTe/Al bilayer: Design, fabrication, optical and ellipsometric characterization
Gaballah AEH, Nicolosi P, Ahmed N, Jimenez K, Pettinari G, Gerardino A, Zuppella P
Applied Surface Science, 463, 75, 2019
3 Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching
Elg DT, Panici GA, Liu SM, Girolami G, Srivastava SN, Ruzic DN
Plasma Chemistry and Plasma Processing, 38(1), 223, 2018
4 Optical properties and oxidation resistance of different transition metals for soft X-ray and EUV applications
Muller R, Yulin S, Naujok P, Kaiser N, Tunnermann A
Thin Solid Films, 624, 1, 2017
5 Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength
Chkhalo NI, Pariev DE, Polkovnikov VN, Salashchenko NN, Shaposhnikov A, Stroulea IL, Svechnikov MV, Vainer YA, Zuev SY
Thin Solid Films, 631, 106, 2017
6 Thermal stability of B-based multilayer mirrors for next generation lithography
Naujok P, Murray K, Yulin S, Patzig C, Kaiser N, Tunnermann A
Thin Solid Films, 642, 252, 2017
7 Interface characterization in B-based multilayer mirrors for next generation lithography
Naujok P, Yulin S, Muller R, Kaiser N, Tunnermann A
Thin Solid Films, 612, 414, 2016
8 Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source
Dolgov A, Lopaev D, Lee CJ, Zoethout E, Medvedev V, Yakushev O, Bijkerk F
Applied Surface Science, 353, 708, 2015
9 Evaluation of Erythemal ultraviolet solar radiation over Saudi Arabia
Al-Mostafa ZA, Elminir HK, Abulwfa A, Al-Shehri SM, Alshehri FA, Al-Rougy IM, Bazyad AA
Solar Energy, 113, 258, 2015
10 Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices
Al-Ajlony A, Kanjilal A, Catalfano M, Harilal SS, Hassanein A
Applied Surface Science, 289, 358, 2014