검색결과 : 38건
No. | Article |
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1 |
Broad-range ultrafast all-optical red-shifting of EUV surface plasmons: Proof-of-principle and advanced surface nanotexturing in aluminum Kudryashov SI, Saraeva IN, Rudenko AA, Ionin AA Applied Surface Science, 471, 23, 2019 |
2 |
Vacuum ultraviolet quarter wave plates based on SnTe/Al bilayer: Design, fabrication, optical and ellipsometric characterization Gaballah AEH, Nicolosi P, Ahmed N, Jimenez K, Pettinari G, Gerardino A, Zuppella P Applied Surface Science, 463, 75, 2019 |
3 |
Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching Elg DT, Panici GA, Liu SM, Girolami G, Srivastava SN, Ruzic DN Plasma Chemistry and Plasma Processing, 38(1), 223, 2018 |
4 |
Optical properties and oxidation resistance of different transition metals for soft X-ray and EUV applications Muller R, Yulin S, Naujok P, Kaiser N, Tunnermann A Thin Solid Films, 624, 1, 2017 |
5 |
Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength Chkhalo NI, Pariev DE, Polkovnikov VN, Salashchenko NN, Shaposhnikov A, Stroulea IL, Svechnikov MV, Vainer YA, Zuev SY Thin Solid Films, 631, 106, 2017 |
6 |
Thermal stability of B-based multilayer mirrors for next generation lithography Naujok P, Murray K, Yulin S, Patzig C, Kaiser N, Tunnermann A Thin Solid Films, 642, 252, 2017 |
7 |
Interface characterization in B-based multilayer mirrors for next generation lithography Naujok P, Yulin S, Muller R, Kaiser N, Tunnermann A Thin Solid Films, 612, 414, 2016 |
8 |
Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source Dolgov A, Lopaev D, Lee CJ, Zoethout E, Medvedev V, Yakushev O, Bijkerk F Applied Surface Science, 353, 708, 2015 |
9 |
Evaluation of Erythemal ultraviolet solar radiation over Saudi Arabia Al-Mostafa ZA, Elminir HK, Abulwfa A, Al-Shehri SM, Alshehri FA, Al-Rougy IM, Bazyad AA Solar Energy, 113, 258, 2015 |
10 |
Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices Al-Ajlony A, Kanjilal A, Catalfano M, Harilal SS, Hassanein A Applied Surface Science, 289, 358, 2014 |