검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
In-situ ellipsometric monitor with layer-by-layer analysis for precise thickness control of EUV multilayer optics Tsuru T, Yamamoto M Thin Solid Films, 515(3), 947, 2006 |
| 2 |
Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometer Tsuru T, Tsutou I, Yamamoto M Thin Solid Films, 455-56, 705, 2004 |
| 3 |
A tracking ellipsometer of picometer sensitivity enabling 0.1 % sputtering-rate monitoring of EUV nanometer multilayer fabrication Yamamoto M, Hotta Y, Sato M Thin Solid Films, 433(1-2), 224, 2003 |