검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Profile simulation of high aspect ratio contact etch Kim D, Hudson EA, Cooperberg D, Edelberg E, Srinivasan M Thin Solid Films, 515(12), 4874, 2007 |
| 2 |
Effect of chamber wall conditions on Cl and Cl-2 concentrations in an inductively coupled plasma reactor Ullal SJ, Godfrey AR, Edelberg E, Braly L, Vahedi V, Aydil ES Journal of Vacuum Science & Technology A, 20(1), 43, 2002 |
| 3 |
Modeling of SiO2 deposition in high density plasma reactors and comparisons of model predictions with experimental measurements Meeks E, Larson RS, Ho P, Apblett C, Han SM, Edelberg E, Aydil ES Journal of Vacuum Science & Technology A, 16(2), 544, 1998 |