검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
A comparison of thickness values for very thin SiO2 films by using ellipsometric, capacitance-voltage, and HRTEM measurements Ehrstein J, Richter C, Chandler-Horowitz D, Vogel E, Young C, Shah S, Maher D, Foran B, Hung PY, Diebold A Journal of the Electrochemical Society, 153(1), F12, 2006 |
| 2 |
Papers from the 3rd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors - 20-22 March 1995 Mcnc-Center-for-Microelectronics, Research-Triangle Park, North-Carolina - Preface Ehrstein J Journal of Vacuum Science & Technology B, 14(1), 191, 1996 |