검색결과 : 38건
| No. | Article |
|---|---|
| 1 |
Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition Altmannshofer S, Miller B, Holleitner AW, Boudaden J, Eisele I, Kutter C Thin Solid Films, 645, 180, 2018 |
| 2 |
Growth of highly textured aluminum films on LiTaO3 with optimized titanium intermediate layers Nussl R, Senft C, Beckmeier D, Jewula T, Ruile W, Sulima T, Hansch W, Eisele I Thin Solid Films, 519(22), 8154, 2011 |
| 3 |
Effect of aging and temperature on alternating current conductivity of tellurium thin films Tsiulyanu D, Marian T, Tiuleanu A, Liess HD, Eisele I Thin Solid Films, 517(8), 2820, 2009 |
| 4 |
Growth and modification of thin a-Si : H/a-Ge : H bi-layers to sacrificial c-SiGe alloys through ArF-Excimer laser assisted processing Chiussi S, Gontad F, Rodriguez R, Serra C, Serra J, Leon B, Sulima T, Hollt L, Eisele I Applied Surface Science, 254(19), 6030, 2008 |
| 5 |
Epitaxy - A way to novel field effect devices Sulima T, Abelein U, Eisele I Thin Solid Films, 517(1), 365, 2008 |
| 6 |
The role of atomic hydrogen in pre-epitaxial silicon substrate cleaning Assmuth A, Stimpel-Lindner T, Senftleben O, Bayerstadler A, Sulima T, Baumgartner H, Eisele I Applied Surface Science, 253(20), 8389, 2007 |
| 7 |
Doping profile dependence of the vertical impact ionization MOSFET's (I-MOS) performance Abelein U, Assmuth A, Iskra P, Schindler M, Sulima T, Eisele I Solid-State Electronics, 51(10), 1405, 2007 |
| 8 |
Conformal aluminum oxide coating of high aspect ratio structures using metalorganic chemical vapor deposition Wiest F, Capodieci V, Blank O, Gutsche M, Schulze J, Eisele I, Matusche J, Schmidt UI Thin Solid Films, 496(2), 240, 2006 |
| 9 |
Sub-50 nm high performance PDBFET with impact ionization Born M, Abelein U, Bhuwalka KK, Schindler M, Schmidt M, Ludsteck A, Schulze J, Eisele I Thin Solid Films, 508(1-2), 323, 2006 |
| 10 |
Optimization of thin, nitrogen-rich silicon oxynitrides grown by rapid thermal nitridation Ludsteck A, Schulze J, Eisele I, Dietl W, Chung H, Nenyei Z, Bergmaier A, Dollinger G Journal of the Electrochemical Society, 152(5), G334, 2005 |