화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Measurements of plasma parameters in capacitively coupled radio frequency plasma from discharge characteristics: Correlation with optical emission spectroscopy
Bora B, Bhuyan H, Favre M, Wyndham E, Chuaqui H, Wong CS
Current Applied Physics, 13(7), 1448, 2013
2 Deposition of nickel oxide by direct current reactive sputtering Effect of oxygen partial pressure
Karpinski A, Ferrec A, Richard-Plouet M, Cattin L, Djouadi MA, Brohan L, Jouan PY
Thin Solid Films, 520(9), 3609, 2012
3 Optical characterization of transparent nickel oxide films deposited by DC current reactive sputtering
Karpinski A, Ouldhamadouche N, Ferrec A, Cattin L, Richard-Plouet M, Brohan L, Djouadi MA, Jouan PY
Thin Solid Films, 519(17), 5767, 2011