검색결과 : 1건
No. | Article |
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1 |
Mechanical effects of polishing pad in copper electrochemical mechanical deposition for planarization Jeong S, Lee S, Park B, Kim H, Kim S, Jeong H Current Applied Physics, 10(1), 299, 2010 |
No. | Article |
---|---|
1 |
Mechanical effects of polishing pad in copper electrochemical mechanical deposition for planarization Jeong S, Lee S, Park B, Kim H, Kim S, Jeong H Current Applied Physics, 10(1), 299, 2010 |