| 1 |
Interface properties and bias temperature instability with ternary H-Cl-N mixed plasma post-oxidation annealing in 4H-SiC MOS capacitors
Yang C, Zhang FL, Yin ZP, Su Y, Qin FW, Wang DJ
Applied Surface Science, 488, 293, 2019 |
| 2 |
Low temperature growth of heavy boron-doped hydrogenated Ge epilayers and its application in Ge/Si photodetectors
Kuo WC, Lee MJ, Wu ML, Lee CC, Tsao IY, Chang JY
Solid-State Electronics, 130, 41, 2017 |
| 3 |
The influence of carbon on the structure and photoluminescence of amorphous silicon carbonitride thin films
Khatami Z, Wilson PR, Wojcik J, Mascher P
Thin Solid Films, 622, 1, 2017 |
| 4 |
Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Mateos D, Diniz JA, Nedev N, Munoz SNM, Curiel M, Mederos M, Valdez B, Montero G
Thin Solid Films, 628, 96, 2017 |
| 5 |
Deposition of silicon oxycarbide thin films from an organosilicon source for polycarbonate glazing
Lee SE, Park YC
Thin Solid Films, 638, 354, 2017 |
| 6 |
Experiment and simulation of tearing mode evolution with electron cyclotron current drive in KSTAR
Kim K, Na YS, Kim M, Jeon YM, Lee KD, Bak JG, Choi MJ, Yun GS, Lee SG, Park S, Jeong JH, Terzolo L, Na DH, Yoo MG
Current Applied Physics, 15(4), 547, 2015 |
| 7 |
Low temperature growth of highly conductive boron-doped germanium thin films by electron cyclotron resonance chemical vapor deposition
Chang TH, Chang C, Chu YH, Lee CC, Chang JY, Chen IC, Li T
Thin Solid Films, 551, 53, 2014 |
| 8 |
Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24 GHz) plasma from silicon tetrafluoride precursor
Mansfeld DA, Vodopyanov AV, Golubev SV, Sennikov PG, Mochalov LA, Andreev BA, Drozdov YN, Drozdov MN, Shashkin VI, Bulkine P, Cabarrocas PRI
Thin Solid Films, 562, 114, 2014 |
| 9 |
Comparative and integrative study of Langmuir probe and optical emission spectroscopy in a variable magnetic field electron cyclotron resonance chemical vapor deposition process used for depositing hydrogenated amorphous silicon thin films
Hu LC, Ruan GM, Wei TC, Wang CJ, Lin YW, Lee CC, Kawai Y, Li TT
Thin Solid Films, 570, 574, 2014 |
| 10 |
저온 증착된 불소도핑 주석 산화 박막의 광학적·전기적 특성
박지훈, 전법주
Korean Journal of Materials Research, 23(9), 517, 2013 |
