화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Titanium-aluminum nitride film growth and related chemistry using dimethylamino-based precursors
Endle JP, Sun YM, Silverman J, Nguyen N, Cowley AH, White JM, Ekerdt JG
Thin Solid Films, 385(1-2), 66, 2001
2 Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films
Endle JP, Sun YM, Nguyen N, Madhukar S, Hance RL, White JM, Ekerdt JG
Thin Solid Films, 388(1-2), 126, 2001
3 Precursor chemistry and film growth with (methylcyclopentadienyl) (1,5-cyclooctadiene)iridium
Sun YM, Yan XM, Mettlach N, Endle JP, Kirsch PD, Ekerdt JG, Madhukar S, Hance RL, White JM
Journal of Vacuum Science & Technology A, 18(1), 10, 2000
4 Iridium film growth with iridium tris-acetylacetonate: oxygen and substrate effects
Sun YM, Endle JP, Smith K, Whaley S, Mahaffy R, Ekerdt JG, White JM, Hance RL
Thin Solid Films, 346(1-2), 100, 1999
5 X-ray photoelectron spectroscopy study of TiN films produced with tetrakis(dimethylamido)titanium and selected N-containing precursors on SiO2
Endle JP, Sun YM, White JM, Ekerdt JG
Journal of Vacuum Science & Technology A, 16(3), 1262, 1998