검색결과 : 33건
| No. | Article |
|---|---|
| 1 |
Assessing the mask clamping ability of a low thermal expansion material chuck Zeuske JR, Vukkadala P, Engelstad RL, Mikkelson AR, Kalkowski G, Risse S, Mueller S Journal of Vacuum Science & Technology B, 28(6), C6E17, 2010 |
| 2 |
Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography Sogard MR, Mikkelson AR, Nataraju M, Turner KT, Engelstad RL Journal of Vacuum Science & Technology B, 25(6), 2155, 2007 |
| 3 |
Distortion of chucked extreme ultraviolet reticles from entrapped particles Ramaswamy V, Engelstad RL, Turner KT, Mikkelson AR, Veeraraghavan S Journal of Vacuum Science & Technology B, 24(6), 2829, 2006 |
| 4 |
Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments Nataraju M, Sohn J, Veeraraghavan S, Mikkelson AR, Turner KT, Engelstad RL, Van Peski CK, Orvek KJ Journal of Vacuum Science & Technology B, 24(6), 2834, 2006 |
| 5 |
Predicting electron projection lithography mask membrane image placement errors Boruszewski MJ, Engelstad RL, Sakaue H, Arimoto H, Eguchi H Journal of Vacuum Science & Technology B, 24(6), 2866, 2006 |
| 6 |
Investigation of overlay errors due to the interaction of optical and extreme ultraviolet mask fabrication processes Zheng L, Engelstad RL, Lovell EG Journal of Vacuum Science & Technology B, 23(6), 3043, 2005 |
| 7 |
Papers from the 48th International Conference on Electron, Ion, And photon Beam Technology and Nanofabrication - Preface Engelstad RL Journal of Vacuum Science & Technology B, 22(6), 2876, 2004 |
| 8 |
Assessment of image placement errors induced in electron projection lithography masks by chucking Chang J, Engelstad RL, Lovell EG, Trybula WJ, Wood OR Journal of Vacuum Science & Technology B, 22(6), 3077, 2004 |
| 9 |
Stress and image-placement distortions of 200 mm low-energy electron projection lithography masks Eguchi H, Susa T, Sumida T, Kurosu T, Yoshii T, Yotsui K, Itoh K, Tamura A, Engelstad RL, Lovell EG, Azkorra X, Mikkelson A, Chang J, Janowski SM Journal of Vacuum Science & Technology B, 22(6), 3087, 2004 |
| 10 |
Controlling imprint distortions in step-and-flash imprint lithography Schuetter SD, Dicks GA, Nellis GF, Engelstad RL, Lovell EG Journal of Vacuum Science & Technology B, 22(6), 3312, 2004 |