화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Formation of graphene/SiC/AIN multilayers synthesized by pulsed laser deposition on Si(110) substrates
Narita S, Meguro K, Takami T, Enta Y, Nakazawa H
Journal of Crystal Growth, 460, 27, 2017
2 Effects of source gases on the properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Nakazawa H, Magara K, Takami T, Ogasawara H, Enta Y, Suzuki Y
Thin Solid Films, 636, 177, 2017
3 Initial oxidation of Si(110) at studied by real-time synchrotron-radiation x-ray photomission spectroscopy
Suemitsu M, Yamamoto Y, Togashi H, Enta Y, Yoshigoe A, Teraoka Y
Journal of Vacuum Science & Technology B, 27(1), 547, 2009
4 Integrated description for random adsorption and 2D-island growth kinetics in thin film growth: Autocatalytic-reaction model and kinetic Monte Carlo simulation
Togashi H, Enta Y, Suemitsu M
Applied Surface Science, 252(16), 5900, 2006
5 Intramolecular cyclization of aminoalkynes catalyzed by PdMo3S4 cubane clusters
Takei I, Enta Y, Wakebe Y, Suzuki T, Hidai M
Chemistry Letters, 35(6), 590, 2006
6 Oxynitridation of Si(100) surface with thermally excited N2O gas
Enta Y, Suto K, Takeda S, Kato H, Sakisaka Y
Thin Solid Films, 500(1-2), 129, 2006
7 Transition from random to island growth mode during Si(100)-(2 x 1) dry oxidation and its description with autocatalytic reaction model
Suemitsu M, Enta Y, Miyanishi Y, Takegawa Y, Miyamoto N
Applied Surface Science, 162, 293, 2000
8 In situ observation of a high-temperature Si(001) surface during SiH2Cl2 exposure by photoelectron spectroscopy
Hori T, Sakamoto H, Takakuwa Y, Enta Y, Kato H, Miyamoto N
Thin Solid Films, 343-344, 354, 1999
9 Real-time core-level spectroscopy of initial thermal oxide on Si(110)
Enta Y, Miyanishi Y, Irimachi H, Niwano M, Suemitsu M, Miyamoto N, Shigemasa E, Kato H
Journal of Vacuum Science & Technology A, 16(3), 1716, 1998
10 Effects of surface phosphorus on the kinetics of hydrogen desorption from silane-adsorbed Si(100) surface at room temperatures
Suemitsu M, Tsukidate Y, Nakazawa H, Enta Y
Journal of Vacuum Science & Technology A, 16(3), 1772, 1998