| 1 |
Scanning Tunneling Microscopy and Theoretical Study of Water Adsorption on Fe3O4: Implications for Catalysis
Rim KT, Eom D, Chan SW, Flytzani-Stephanopoulos M, Flynn GW, Wen XD, Batista ER
Journal of the American Chemical Society, 134(46), 18979, 2012 |
| 2 |
Palladium-catalyzed Carbon-Sulfur Cross-coupling Reactions of Aryl Chlorides with Indium Tris(organothiolates)
Mo J, Eom D, Kim SH, Lee PH
Chemistry Letters, 40(9), 980, 2011 |
| 3 |
Enhanced nucleation Behavior of atomic-layer-deposited ru film on low-k dielectrics afforded by UV-O-3 treatment
Heo JY, Lee SY, Eom D, Hwang CS, Kim HJ
Electrochemical and Solid State Letters, 11(2), G5, 2008 |
| 4 |
Thermal annealing effects on the atomic layer deposited LaAlO3 thin films on Si substrate
Eom D, Hwang CS, Kim HJ, Cho MH, Chung KB
Electrochemical and Solid State Letters, 11(7), G33, 2008 |
| 5 |
The role of the methyl and hydroxyl groups of low-k dielectric films on the nucleation of ruthenium by ALD
Heo J, Won SJ, Eom D, Lee SY, Ahn YB, Hwang CS, Kim HJ
Electrochemical and Solid State Letters, 11(8), H210, 2008 |
| 6 |
Electronic properties of atomic-layer-deposited Al2O3/thermal-nitrided SiO2 stacking dielectric on 4H SiC
Cheong KY, Moon JH, Eom D, Kim HJ, Bahng W, Kim NK
Electrochemical and Solid State Letters, 10(2), H69, 2007 |
| 7 |
Improvement in thermal stability of stacked structures of aluminum nitride and lanthanum oxide thin films on si substrate
Eom D, No SY, Park H, Hwang CS, Kim HJ
Electrochemical and Solid State Letters, 10(12), G93, 2007 |
| 8 |
Deposition characteristics and annealing effect of La2O3 films prepared using La(iPrCp)(3) precursor
Eom D, No SY, Hwang CS, Kim HJ
Journal of the Electrochemical Society, 154(3), G49, 2007 |
| 9 |
Study of thermal degradation of organic light emitting device structures by X-ray scattering
Lee YJ, Lee H, Byun Y, Song S, Kim JE, Eom D, Cha W, Park SS, Kim J, Kim H
Thin Solid Films, 515(14), 5674, 2007 |
| 10 |
Properties of aluminum nitride thin films deposited by an alternate injection of trimethylaluminum and ammonia under ultraviolet radiation
Eom D, No SY, Hwang CS, Kim HJ
Journal of the Electrochemical Society, 153(4), C229, 2006 |
