화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Dual-Plasma Reactor for Low-Temperature Deposition of Wide Band-Gap Silicon Alloys
Etemadi R, Godet C, Perrin J, Drevillon B, Huc J, Parey JY, Rostaing JC, Coeuret F
Journal of Vacuum Science & Technology A, 15(2), 320, 1997
2 Highly Homogeneous Silica Coatings for Optical and Protective Applications Deposited by PECVD at Room-Temperature in a Planar Uniform Distributed Electron-Cyclotron-Resonance Plasma Reactor
Rostaing JC, Coeuret F, Pelletier J, Lagarde T, Etemadi R
Thin Solid Films, 270(1-2), 49, 1995
3 Silicon-Based, Protective Transparent Multilayer Coatings Deposited at High-Rate on Optical Polymers by Dual-Mode MW/RF PECVD
Rostaing JC, Coeuret F, Drevillon B, Etemadi R, Godet C, Huc J, Parey JY, Yakovlev VA
Thin Solid Films, 236(1-2), 58, 1993