화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 In vivo reprogramming of wound-resident cells generates skin epithelial tissue
Kurita M, Araoka T, Hishida T, O'Keefe DD, Takahashi Y, Sakamoto A, Sakurai M, Suzuki K, Wu J, Yamamoto M, Hernandez-Benitez R, Ocampo A, Reddy P, Shokhirev MN, Magistretti P, Delicado EN, Eto H, Harii K, Belmonte JCI
Nature, 561(7722), 243, 2018
2 Preference for Color-Enhanced Images Assessed by Color Deficiencies
Chen YC, Guan YG, Ishikawa T, Eto H, Nakatsue T, Chao JH, Ayama M
Color Research and Application, 39(3), 234, 2014
3 Intermediate temperature solid oxide fuel cells using LaGaO3 based oxide film deposited by PLD method
Ishihara T, Eto H, Yan JW
International Journal of Hydrogen Energy, 36(2), 1862, 2011
4 Improvement in Thermal Cycling Durability of SOFCs Using LaGaO3-Based Electrolyte by Inserting Convex Sm0.5Sr0.5CoO3 Interlayer
Ju YW, Eto H, Inagaki T, Ida S, Ishihara T
Electrochemical and Solid State Letters, 13(12), B139, 2010
5 Preparation of Ni-Fe bimetallic porous anode support for solid oxide fuel cells using LaGaO3 based electrolyte film with high power density
Ju YW, Eto H, Inagaki T, Ida S, Ishihara T
Journal of Power Sources, 195(19), 6294, 2010
6 Sulfur Poisoning of SOFC Cathodes
Xiong YP, Yamaji K, Horita T, Yokokawa H, Akikusa J, Eto H, Inagaki T
Journal of the Electrochemical Society, 156(5), B588, 2009
7 Behavior of reaction products during puddle development in fabrication of ultralarge-scale integrations
Eto H, Ito Y, Homma T
Journal of the Electrochemical Society, 154(9), H764, 2007
8 Comparison of flow models for photoresist Behavior at contact holes in thermal flow processes
Eto H, Miyazaki M, Kondoh T, Shiobara E, Ito S, Homma T
Journal of the Electrochemical Society, 154(10), H894, 2007
9 Expression of lectin-like oxidized LDL receptor-1 in smooth muscle cells after vascular injury
Eto H, Miyata M, Kume N, Minami M, Itabe H, Orihara K, Hamasaki S, Biro S, Otsuji Y, Kita T, Tei C
Biochemical and Biophysical Research Communications, 341(2), 591, 2006
10 Highly selective photoresist ashing by addition of ammonia to plasma containing carbon tetrafluoride
Saito M, Eto H, Omiya K, Homma T, Nagatomo T
Journal of the Electrochemical Society, 148(2), G59, 2001