검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP) Jung HY, Park YR, Lee HJ, Lee NE, Jeong CY, Ahn J Thin Solid Films, 517(14), 3938, 2009 |