1 |
Decomposition and Debromination of Monobromoacetic Acid by Radio Frequency Discharge in an Aqueous Solution Wang L, Wang JX, Zhang SL, Liao WC Plasma Chemistry and Plasma Processing, 37(6), 1463, 2017 |
2 |
Anodization of titanium in radio frequency oxygen discharge -Microstructure, kinetics & transport mechanism Gottlicher M, Rohnke M, Kunz A, Thomas J, Henning RA, Leichtweiss T, Gemming T, Janek J Solid State Ionics, 290, 130, 2016 |
3 |
Formation of silicon nanocrystal films at low temperature during capacitive radio frequency discharge transition to the high-current mode Xu YM, Yu W, Jiang ZY, Li Y, Li HM, Feng HN Thin Solid Films, 569, 52, 2014 |
4 |
Characterization of a high-frequency inductively coupled plasma source Lee DS, Jun HS, Chang HY Thin Solid Films, 506, 469, 2006 |
5 |
A Kinetic Study on the Conversion of Methane to Higher Hydrocarbons in a Radio-Frequency Discharge Savinov SY, Lee H, Song HK, Na BK Korean Journal of Chemical Engineering, 21(3), 601, 2004 |
6 |
Development of a large-area, multi-helicon rectangular plasma source for TFT-LCD processing Kim YJ, Han SH, Hwang W, Hwang YS Thin Solid Films, 435(1-2), 270, 2003 |
7 |
Cluster-suppressed plasma CVD for deposition of high quality a-Si : H films Shiratani M, Koga K, Watanabe Y Thin Solid Films, 427(1-2), 1, 2003 |
8 |
Optimization of plasma density and radial uniformity of a point-cusp magnetic field applied capacitive plasma Wickramanayaka S, Nakagawa Y, Sago Y, Numasawa Y Journal of Vacuum Science & Technology A, 18(3), 823, 2000 |
9 |
Large-diameter microwave plasma source excited by azimuthally symmetric surface waves Tuda M, Ono K, Ootera H, Tsuchihashi M, Hanazaki M, Komemura T Journal of Vacuum Science & Technology A, 18(3), 840, 2000 |
10 |
Diagnostics of the diamond depositing inductively coupled plasma by electrostatic probes and optical emission spectroscopy Teii K Journal of Vacuum Science & Technology A, 17(1), 138, 1999 |