1 |
In-situ characterization of electron-assisted regeneration of Cz-Si solar cells Helmich L, Walter DC, Bredemeier D, Falster R, Voronkov VV, Schmidt J Solar Energy Materials and Solar Cells, 185, 283, 2018 |
2 |
On the equilibrium concentration of boron-oxygen defects in crystalline silicon Walter DC, Falster R, Voronkov VV, Schmidt J Solar Energy Materials and Solar Cells, 173, 33, 2017 |
3 |
Lifetimes exceeding 1 ms in 1-Omega cm boron-doped Cz-silicon Walter DC, Lim B, Bothe K, Falster R, Voronkov VV, Schmidt J Solar Energy Materials and Solar Cells, 131, 51, 2014 |
4 |
Intrinsic point defects and grown-in microdefects in silicon crystals-comment on: "Intrinsic point defect behaviour in silicon crystals during growth from the melt: A model derived from experimental results'', T. Abe, T. Takahashi, Journal of Crystal Growth 334 (2011) 16 Voronkov VV, Falster R Journal of Crystal Growth, 351(1), 115, 2012 |
5 |
Correlated out-diffusion of nitrogen and in-diffusion of self-interstitials resulting in elimination of nitrogen-related deep centres Voronkov VV, Falster R Thin Solid Films, 518(9), 2346, 2010 |
6 |
Electrical properties of nitrogen-doped Float-Zoned silicon annealed in a range of 200 to 900 degrees C Voronkova GI, Batunina AV, Voronkov VV, Falster R, Golovina VN, Guliaeva AS, Tiurina NB Thin Solid Films, 518(9), 2350, 2010 |
7 |
The effect of nitrogen on void formation in Czochralski silicon crystals Voronkov VV, Falster R Journal of Crystal Growth, 273(3-4), 412, 2005 |
8 |
Quantification of defect dynamics in unsteady-state and steady-state Czochralski growth of monocrystalline silicon (vol 151, pg G663, 2004) Kulkarni MS, Voronkov V, Falster R Journal of the Electrochemical Society, 152(1), L2, 2005 |
9 |
Quantification of defect dynamics in unsteady-state and steady-state Czochralski growth of monocrystalline silicon Kulkarni MS, Voronkov V, Falster R Journal of the Electrochemical Society, 151(10), G663, 2004 |
10 |
Intrinsic point defects and impurities in silicon crystal growth Voronkov VV, Falster R Journal of the Electrochemical Society, 149(3), G167, 2002 |